Obducat is a supplier of lithography solutions for manufacturing and replication of advanced micro and Nano scale structures; for industrial mass production as well as for research and development.
The EITRE Nano Imprint Lithography (NIL) series offer a flexible and cost efficient lithography solution for R&D applications
EITRE® offers a complete range of imprint methods, including thermal NIL, hot embossing, UV NIL, as well as Obducat's proprietary Simultaneous Thermal and UV (STU®) imprint process.
All Nano Imprint Lithography (NIL) systems from Obducat are equipped with full area thermal imprint, using the patented SoftPress® technology. The proprietary design of the heater, embedded in the substrate chuck, provides a homogeneous temperature distribution across the whole imprint area. The uniform heating and a wide range of temperature settings, makes it possible to use a wide range of imprint polymer.
Eitre LA Gen 2 available for large area R&D (370mm x 470mm)
The SINDRE 60 Nano Imprint Lithography (NIL) system is designed for semi-automated production, using Obducat's proprietary IPS®/STU® process. The system generates a throughput of 12 imprinted cycles per hour.
The SINDRE 400 / 600 / 800 Nano Imprint Lithography (NIL) systems are designed for fully automated high volume production. The high throughput (up to 30 wafers and hour) and yield enables an unsurpassed efficient cost of ownership.
Sindre LA Gen 5 available for large area (1100mm x 1300mm) Launch 2016