Sistem Technology

Mask Aligners, Contact, Proximity, Projection.

NEUTRONIX –QUINTEL MASK ALIGNERS

Neutronix-Quintel (NXQ) is a premier provider of new production Mask Alignment systems used for contact, proximity and projection printing in LED, Bio-Medical, Microfluidics, MEMs, Solar Cell, Optoelectronics and other semiconductor discrete device applications

NXQ offers high volume, fully automated systems with front side automatic and backside alignment, as well as manual systems for low volume production or Research and Development use


 		 NEW - NXQ 8000 R&D and Production Mask Aligner.
  • PC Based – Graphical user Interface
  • Pieces up to 8” Round Substrates
  • Optional Scan Stage move mask & wafer simultaneously under microscopes
  • Print Resolution > 0.5um
  • Compound X-Y-Theta Alignment Stage with 100nm Resolution
  • Hard/Soft Contact, Vacuum Contact, Proximity Printing modes
  • Optional Autoload – Modular / Upgradeable
  • Broadband, NUV or DUV Lamp house
  • IR Alignment and Optical Backside Alignment
  • Motorized stage with automatic re-centering
 NXQ8000 Competitive Advantages.

Wedge Error Compensation System
Z-Axis Guide Set System (Precise control of force during WEC –Ideal for fragile materials)
New - Enhanced Printing Optics (excellent CD across wafer)
Modular Lamp house Design
Compound X-Y-Theta Alignment Stage
Video View Microscope
Quadcam Option – New! (Switch wide view to high mag. without re-focussing)
Auto Align - Front and Backside Alignment (Standard on Manual and Automated systems) Alignment overlay +/- 0.5 um
Low Cost of Ownership
  NXQ 4006 R&D and Production Contact Mask Aligner.
Substrate size from pieces to 150 mm diameter
Manual X, Y and theta alignment stage
Vacuum / Pressure contact exposure modes
Optical Split field and CCTV microscope options
Simple, topside mask loading
Low maintenance		 Available Options:
  • Infrared (IR) back side alignment
  • Large gap alignment
  • UV / NUV / DUV exposure optics
  • Carousel load
MODEL NXQ 4004
  • Substrate size from pieces to 100 mm diameter
  • UV/NUV exposure optics
  NXQ 1200 Flood Expose System
A unique machine with single and double-sided exposure capability. Designed specifically for single mask level applications and/or gross geometries and non-critical alignment - current applications include power devices, LEDs and MEMs applications.

R&D and production applications
Manual loading of substrates
Single-side and double-side exposure capability
Small pieces to 200 mm diameter substrate size		 Available Options:
  • CCTV Microscope
  • Manual X, Y and theta alignment stage

Canon PLA and MPA Series Mask Aligners

In addition to its line of new mask aligners, NXQ also offers remanufacturing, upgrades, support, training and spare parts for Canon PLA and MPA Mask Aligners

  CANON PLA 501/600 FEATURES
  • Contact/Proximity Alignment - 60-100 WPH
  • Infrared Backside Alignment
  • Dual Channel Light Integration or C.I.
  • Fibre Optic Illumination
  • High Resolution Video
  • Wafer Sizes: 2" to 6" Semi Spec, Pieces, Square
  • Wafer Feed: Manual and/or Cassette to Cassette Auto Feeder
  • Alignment: Manual / Auto
  • UV Power: 250, 350, 500 Watts, 1 and 2 KWatts
  • UV Spectrum: Deep UV, Near Deep UV, Near UV
  • Resolution: Less Than .5um in Hard Contact
  CANON MPA 600 FEATURES
  • Projection Alignment - 72 WPH
  • Temperature Control
  • Thermal/Pneumatic Distortion Control
  • 1X Scanning
  • Mask Changer (Optional)
  • Wafer Sizes: 3" to 6" Semi Spec
  • Wafer Feed: Dual Cassette, Auto Feeder
  • Alignment: Manual / Automatic
  • Resolution: 1.5um CD with Depth-Of-Focus +-6um

Link to manufacturer’s web site; www.neutronixinc.com