ATOMIC LAYER DEPOSITION
Picosun is a direct descendant of the very beginning of Atomic Layer Deposition. ALD was invented in Finland in 1974 by Dr.Tuomo Suntola, Member of the Picosun Board of Directors. Our CTO Sven Lindfors has designed outstanding ALD systems continuously since 1975. Combined, Picosun people share over 200 years of ALD experience forming what many describe as “by far, the best ALD team ever”.
SUNALE™ ALD Process Tool
 Features
- Extremely versatile processing capabilities packed in compact, handy and lightweight structure
- Highly customizable reactor structure with variety of source, reaction chamber and wafer transfer options
- Uniform and ultra-conformal film deposition on 2-8’’ planar substrates, 4’’ wafer batches (25 wafers), 3D objects, powders and through porous substrates
- Process temperatures up to 500°C
- Precursor sources for gaseous, liquid and solid chemicals
- Heated precursor source temperature up to 200°C.
The SUNALE™ R-series ALD
reactor has been optimised for research, Product development, and pilot production, while the SUNALE™ P-series offers fast and reliable compact reactors for production purposes. Picosun’s mission is to develop and produce the highest-quality ALD tools for the world-wide markets.
 Up to six precursor sources allow wide variety of processes from basic oxides and nitrides to advanced nanolaminates and graded layers - Professional ALD software installed in user-friendly touch panel PC
- Optional substrate loader, vacuum pump, ozone delivery system and nitrogen generator can be bought together with the ALD process tool
Examples of ALD applications
MEMS coatings, passivation coating, insulator for microelectronics, ion diffusion barrier, fill layers for magnetic read heads, etch stop layer
Optoelectronics, gas sensors, antistatic coatings, ARC
Photocatalytic coatings, Photovoltaics, antistatic coatings
Catalyst coatings, optical switching materials, energy storage
Semiconductor materials, buffer layers in solar cells, UV blocking layer
Metal electrodes, diffusion barriers
 High-k dielectrics
Metal electrodes Ruthenium,
Ternary materials high-k dielectrics
Nanolaminates as electrical insulator
Doped thin films for electroluminescent displays
Mixed oxides as ferroelectric layer
Graded layers
Press release January 2010
Picosun introduces revolutionary sealed precursor cartridge
 Exposure to air can damage a precursor by changing its qualities so that it no longer vaporizes properly in the ALD process. Many of the new metal-organic precursors are expensive even in small quantities. Picosun’s new sealed cartridge will guarantee that valuable precursors are no longer ruined due to unintentional mishaps in cartridge handling.
The new sealed cartridge adds to the already incomparable qualities of Picosolid™ Booster. It also yet again underlines how unique the modular end expandable design of Picosun’s SUNALE™ family of ALD systems is: This new feature fits seamlessly into the structures of any and all existing SUNALE™ reactors equipped with a Picosolid™ Booster.
Link to manufacturers website: www.picosun.com
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