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RCH Associates

RCH Associates specializes in new LPCVD/Diffusion systems as well as replacement OEM gas systems (Thermco, Bruce, Tempress, ACS, etc.) fully retrofittable into existing or remanufactured source cabinets. RCH’s portfolio of products and capabilities extends from basic Bench Top Furnaces or Research Grade systems to high production, full capability horizontal stacks.

Furnace Processing Systems

Model 5604

  • Semiconductor applications. 75 to 150mm diameter wafers.
  • 150 to 300 wafers per batch per tube-level
  • 30 in. (762mm) thermal flat zone
  • Cantilever, push/puller or manual loading
  • LPCVD or diffusion processing subsystems
  • 350 to 1300oC temperature range
  • Integrated ASTRA Control System
  • Semiconductor applications. 75 to 150mm diameter wafers.
  • 150 to 300 wafers per batch per tube-level
  • 30 in. (762mm) thermal flat zone
  • Cantilever, push/puller or manual loading
  • LPCVD or diffusion processing subsystems
  • 350 to 1300oC temperature range
  • Integrated ASTRA Control System

Model 5644

  • Semiconductor applications. 100 to 150mm diameter wafers.
  • 200 to 400 wafers per batch per tube-level
  • 40 in. (1016mm) thermal flat zone
  • Cantilever, push/puller or manual loading
  • LPCVD or diffusion processing subsystems
  • 350 to 1300oC temperature range
  • Integrated ASTRA Control System

Model 6844

  • Semiconductor applications. 200mm diameter wafers.
  • 150 wafers per batch, typical
  • 36 in. (914.4mm) thermal flat zone
  • Cantilever loading
  • LPCVD or diffusion processing subsystems
  • 400 to 1300oC temperature range
  • Integrated ASTRA Control System

Model PV-6 (Photovolatics)

  • Solar cell applications. Up to 125mm square or pseudo-square substrates.
  • 400 substrates per batch
  • LPCVD or diffusion processing subsystems
  • Preferred for POCl3 emitter diffusion
  • 400 to 1300oC temperature range
  • Integrated ASTRA Control System

Model PV-8 (Photovolatics)

  • Solar cell applications. 156mm square or pseudo-square substrates.
  • 400 substrates per batch
  • Preferred for POCl3 emitter diffusion
  • LPCVD or diffusion processing subsystems
  • 400 to 1300oC temperature range
  • Integrated ASTRA Control System

ASTRA Control System

Example Operator Screen

FEATURES

  • Microcomputer (per tube-level)
    Intel Core2Duo Processor.
    DDRII RAM.
    High capacity hard drive.
    Flash drive data transfer.
    Microsoft Exel compatible.

  • Touch Screen
    High-resolution.
    Fab-friendly touch even with cleanroom gloves.

  • Temperature
    Multiple control loops.
    Spike TC, profile TC or cascade control.
    Auto profile or custom PID.
    Programmable temperature tolerancing.
    NIST offset program.
    Data acquisition, logging and graphing.
    0.1oC control resolution.

  • Gas, Fluids and Vacuum
    Multiple MFC control loops.
    Programmable flow tolerance monitor and alerts.
    Fault redirects with abort or branch.
    Interface programming of peripheral components.
    Comprehensive LPCVD vacuum control monitoring.
    LPCVD auto leak-test protocol.
    Hardware and firmware safety interlock.

  • Loading
    Intelligent motor control.
    Programmable motion and feedback logic.
    End-of-travel sensing with next-step function.
    Over-travel sensing with fault redirects.

  • Power
    120/220/240VAC, 50 or 60 Hz with UPS

  • Example States and Functions
    Operation and programming.
    Navigate.
    Password management and access rights.
    Recipe editing.
    Temperature parameters.
    Gas/fluid parameters.
    Vacuum paramters.
    Loading parameters.
    Step times and event response editing.
    Calibrations.
    Alarm fault redirects.
    Hardwire relay logic and firmware interlocks.

BENEFITS

  • Precise control of temperature, gas and fluid flow, vacuum and loading parameters for optimum process performance and repeatability.
  • Intuitive programming and operation through graphical touch screen access for easy training and operation.
  • Tube-level microcomputer for high speed and masterful data management, which results in optimized yields and process tracking.
  • Distributed control with full safety interlocks for gas flow, vacuum, temperature and loading, which provide safe, reliable operation.
  • Optimized temperature control with divisible cascading and auto profiling to setup and maintain optimum temperature parameters.
  • User permissions protocols assure only qualified personnel can access programming, recipes and parameters.
  • Comprehensive alerts, alarms, redirects and monitors for all parameters. Provides instant responses, reporting and recording of anything that affects process perfomance or safety.
  • Full maintenance accessibility with integral trouble- shooting and calibrations. Provides data for maintenance with no additional maintenance computer required.
  • Advanced LPCVD control and monitoring functions for sustained process repeatability.
  • On-screen keyboard for easy data entry.
  • Lot tracking/run history for multiple lots per run. Allows recipe tracking of wafers and wafer lots.
  • Retrofitable to most any furnace brand or model. Modernizes all control attributes at low cost.
  • Optional ASTRA Host System. Provides centralized factory recipe management, downloading, data acquisition and logging for up to 99 tube-levels.

Gas Systems and Liquid Source Delivery Systems

RCH Associates' gas systems are designed for:

  • Diffusion, oxidation and LPCVD processing systems in RCH Furnace Processing Systems
  • Retrofitting existing furnace systems to upgrade or convert processes in existing furnace systems of most any make or model
  • Customization for special gas delivery applications

A gas system, which is sometimes referred to as a "gas tray" or "gas platter", is a plate that provides mounting of all the gas control and plumbing components required to perform a specificed process.

RCH is noted for pristine, high performing gas systems with great attention to detail and maintainability.

Mass flow contoller-based gas systems are standard. Rotameter gas systems are also available.

General Component Information

  • Bolt plate mounted components
  • Type 316L seamless stainless steel tubing weldments with electropolish
  • High performance mass flow controllers
  • Orbital weld VCR and Microfit fittings throughout
  • Pneumatic diaphragm valves
  • Manual diaphram valves
  • Miniature solenoid valve manifolds for pneumatics
  • Welded check valves
  • Submicron inline filters
  • Associated Teflon plumbing and fittings

All gas systems are manufactured in the RCH clean room, tested to high quality control standards and helium leak tested.

For further information on RCH Associates systems click here

For further assistance please contact us