 | Automated Photoresist Processing Equipment
Semi-Automatic Wafer and Substrate Processing Equipment
Wafer Mounting and Wafer Preparation Equipment |
  | Drying-, Coating - Spinner.
The Spinner Module is easy to operate as a bench mounted or tabletop process tool. It is designed to dry or coat wafers up to 6“(150mm) dia. or substrates up to 5“x 5“ (127x127mm). The primus-line provides high uniformity and repeatability with easy operation and maintenance.
Primus STT15
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  | SPINNER MODULES
The OPTIspin SB spinner modules are process tools for standard open bowl coating applications of wafers and other substrates. The design of the three piece process bowl provides excellent coating uniformity and repeatability for 2“ up to 12“ wafers or up to 9“ x 9“ substrates. It is also possible to perform developing, basic cleaning or drying applications with this spinner system
OPTIspin SB30, with Touchscreen
For More Information Please click here |  | HOTPLATE MODULES
The OPTIhot HB hotplate modules for standard lithography baking applications like Soft and Hard bake or similar processes up to 300°C. The hotplate is suitable for wafers up to 12“ and substrates up to 9“x 9“.
OPTIspin HB20
For More Information Please click here |  | WET PROCESS MODULES
The OPTIwet SB 30 Wet Process Module is a new designed tool for single substrate wet process applications, like cleaning, developing, etching or resist stripping. The optimized process chamber with interlocked chamber door provides excellent process results, cleanliness and repeatability for substrates up to 9"x 9" or wafers up to 300mm.
The OPTIwet SB 30 is suitable to be set into any kind of wet bench and table. The modules have been specifically designed for easy operation and maintenance. With the wide range of options (e.g. programmable dispense arm) the system can be upgraded for higher automation and improved wafer to wafer process repeatability.
OPTIwet SB30
For More Information Please Click Here |  | SPIN COATING MODULES
The OPTIcoat SB 30+ Coating Module is a coating spinner with a process optimized covered chuck technology for wafers up to 300 mm or substrates up to 9"x 9". The new design of the three piece process bowl and the covered chuck technology provide excellent coating uniformity and repeatability, especially for thick resist layers, high topography or square substrates. The OPTIcoat SB 30+ is suitable to be set into any kind of wet bench and table. The modules have been specifically designed for easy operation and maintenance. With the wide range of options (e.g. programmable dispense arm) the system can be upgraded for higher automation and improved wafer to wafer process repeatability.
OPTIcoat SB30+
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COATER, DEVELOPER, WET PROCESS, SPINNER, HOT- COOL- AND PRIMER PLATES, LOW VOLUME SEMIAUTOMATIC SYSTEMS
For Laboratory / R&D / Low Volume Production.
baking-priming coating, developing, etching, drying, cleaning, lift off
 | The OPTIcoat ST 23+ Coating System is a process tool for coating applications with a process optimized covered chuck technology and integrated hotplate for wafers from 2” to 8” or substrates up to 6”x 6”, extended by hard/soft bake and a HMDS vapor prime process. The new designed three piece process bowl and the covered chuck technology provide excellent coating uniformity and repeatability especially for thick resist layers, high topography or square substrates.
OPTIcoat ST23+
For More Information Please click here |  | WET PROCESS SPINNER SYSTEM
The OPTIwet ST 75 Wet Process System is designed for single substrate processing. The OPTIwet ST 75 can be utilized for Cleaning, Developing, Lift-off, Etching or Resist Stripping. The optimized process chamber provides excellent process results, repeatability and safe handling of substrates up to 508 x 508 mm (20"x 20"). Due to the modular design the OPTIwet ST 75 can be equipped with a wide range of options and can be upgraded to automation for higher throughput if required.
OPTIwet ST75, spinner
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  | The DOMINUS Coater, OPTIcoat ST30i is a new and innovative spray coating system with a revolutionary nozzle concept. The patent pending micro spray nozzle allows, together with a closed process chamber and process approved exhaust system, uniform coatings over high topography surfaces
DOMINUS coater, OPTIcoat ST22i
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 | MICRO CLUSTER SYSTEM
The Maximus 804 is a fully automatic and programmable cassette-to-cassette micro-cluster system. It can be equipped with modules as coater, developer, cleaner, HMDS vapour primer, hotplates and cool plates for wafer sizes from Ø 2" up to Ø 8" and substrates from 2"x 2" up to 6"x 6". A precise and fast running robot, located in the centre of the micro-cluster is able to handle even fragile materials very gently. This system offers manufacturers a maximum of flexibility to find exactly the right configuration for their process needs and provides excellent uniformity and repeatability.
Maximus 804
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 | MANUAL WAFER MOUNTING TOOL
The new SSE "Manual Wafer Mounting Tool" AFFIXXO m was designed for manual mounting of individual wafers onto rigid carriers or other wafers. This basic laboratory tool utilizes the patented SSE wafer mounting technology originally developed by SSE for its advanced automated wafer mounting and demounting equipment. The AFFIXXO m is versatile tool that is ideal for many R&D wafer mounting applications. The AFFIXXO m can also be equipped with a separate Hotplate module for heating of the carrier and onto which the handheld tool is manually placed for the mounting process.
Affixxo m
For More Information Please click here |  | MANUAL WAFER DEMOUNTING SYSTEM
The new SSE "Manual Wafer Demounting System" DEFIXXO m was designed for demounting individual wafers from rigid carriers or other wafers. This laboratory system utilizes the patented SSE wafer demounting technology originally developed by SSE for its advanced automated wafer mounting and demounting equipment. Optional accessories coordinated to your specific demands are available.
Defixxo m
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Link to Manufacturers website http://www.sse-semi.com/docs/index.aspx?id=32381&domid=1068&sp=E&addlastid=&m1=31886&m2=32381
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