Resist strip cleaning
Intelligent fluids GmbH has developed cleaning fluids which can remove persistent pollutants and organic materials in the microelectronic sector.
Different formulations are capable of removing a multitude of different carbon modifications (e.g. graphene,C 60, C 70), organic compounds and also insulating layers (e.g. polyimides) and metal depossitions (Ag, Au, Cu, Si etc.). Special printing inks for printed electronic circuits as well as photoresist layers can be removed.
Different formulations are capable of removing a multitude of different carbon modifications (e.g. graphene,C 60, C 70), organic compounds and also insulating layers (e.g. polyimides) and metal depossitions (Ag, Au, Cu, Si etc.). Special printing inks for printed electronic circuits as well as photoresist layers can be removed.
Advantages of Intelligent Fluid
- Water Based
- Physical Function (no chemical attack)
- Biodegradable
- Dermatologically approved
- Non-inflammable
- pH-neutral
- Thermodynamically stable
Typical Applications
- Equipment Cleaning - Catch Cups,
- Chambers, Furnaces, Parts
- Metal Lift-Off - MEMS, LED, BEOL
- Photoresist Stripping - FEOL, BEOL, BE, Photo Mask Applications
- Adhesive Removal - Flat Panel Display, Temporay Bonding
- Glass and Lens Cleaning - Removal of Oils, Fingerprints and Organics
- Replacment of - NMP, DSMO, SPM, Acetone
