- Precursors : Liquid, solid, gas, ozone (up to 6 sources with 4 separate inlets)
- Typical processes: Al2O3, TiO2, SiO2, Ta2O5, HfO2, ZnO, ZrO2, TiN, AlN, metals such as Pt or Ir
- 50 – 500°C
- 50-200 mm single wafers
- 156 mm x 156 mm solar Si wafers
- 3D objects
- Powders and particles
- Mini-batch
Email: info@sistemtechnology.com Call: +44 (0)1327 362 844
Atomic Layer Deposition (ALD)
Picosun Group, a global leader in the field of Atomic Layer Deposition (ALD) technology, is an Applied Materials company renowned for its innovative solutions and cutting-edge expertise.
Founded in Espoo, Finland, Picosun has been pioneering the development and commercialisation of advanced atomic layer deposition systems since 2004. The company’s core mission is to empower industries worldwide by providing high-quality, reliable, and scalable atomic layer deposition equipment that enables the manufacturing of next-generation nanoscale devices and materials.
Catering to a wide array of sectors, including semiconductors, electronics, renewable energy, and life sciences, Picosun’s robust atomic layer deposition systems are designed to meet diverse requirements while maintaining unparalleled process control and precision. By fostering a strong commitment to continuous research and development, Picosun is poised to drive the future of material sciences and facilitate the creation of groundbreaking technologies that will redefine our world.
Cutting-Edge ALD technology
Picosun's atomic layer deposition systems are known for their advanced capabilities and performance, enabling precise and uniform thin film deposition at the atomic level. This allows for better control of the materials' properties and improved device performance.Wide Range of Applications
Picosun's ALD solutions cater to various industries, including semiconductors, electronics, energy, optics, medical, and research. Their atomic layer deposition equipment is suitable for multiple applications, such as protective coatings, barrier layers, and functional films.Customisation and Scalability
Picosun offers a comprehensive range of atomic layer deposition systems, from benchtop units for research and development purposes to large-scale production equipment. Their solutions can be tailored to meet specific customer requirements and can be easily scaled to accommodate growing production needs.High-Quality Customer Service
Picosun is committed to providing excellent customer support, including installation, training, and maintenance services and SiSTEM Technology have a local expert to cover tools in the UK and Ireland. They also offer consultation services to help clients optimise their atomic layer deposition processes and achieve the best possible results.Strong Research & Development
Picosun continuously invests in research and development to stay at the forefront of atomic layer deposition technology. They collaborate with leading research institutions, universities, and industry partners to develop innovative ALD solutions and applications.Environmental Responsibility
Picosun's ALD solutions are designed with environmental sustainability in mind. Atomic layer deposition enables energy-efficient manufacturing processes, reduced waste generation, and the development of clean energy technologies, such as solar panels and batteries.Products from Picosun
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R-200 Standard
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R-200 Advanced
- 50-200 mm single wafers
- 156 mm x 156 mm solar Si wafers
- 3D objects
- Powders and particles
- Mini-batch
- Porous, through-porous, and high aspect ratio (up to 1:2500)
- Typical processes: Al2O3, TiO2, SiO2, Ta2O5, HfO2, ZnO, ZrO2, AlN, TiN, metals such as Pt or Ir
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P-300B
- 200 mm wafers in batches of 25 pcs (standard pitch)
- 150 mm wafers in batches of 50 pcs (standard pitch)
- 100 mm wafers in batches of 75 pcs (standard pitch)
- All kinds of 3-dimensional items such as mechanical machinery parts, coins, watch parts and jewellery, lenses, optics, and medical equipment, surgical implants and implantable devices (PicoMEDICAL® solutions)
- High aspect ratio samples (up to 1:2500)
- 50 – 500°C
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P-300BV
- Batch processes available with cycle times down to single digit seconds
- Al2O3, SiO2, Ta2O5, HfO2, ZnO, TiO2, ZrO2, AlN, TiN, and metals
- Down to <1% 1σ non-uniformity in a batch (Al2O3, WIW, WTW, B2B, 49 pts, 5mm EE)
- Liquid, solid, gas, ozone
- Up to 8 sources with 4 separate inlets
- Level sensors, cleaning and refill service
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P-1000
- All kinds of 3-dimensional items such as mechanical machinery parts, glass or metal sheets, coins, watch parts and jewelry, lenses, optics, and medical equipment, surgical implants and implantable devices (PicoMEDICAL™ solutions)
- Typical processes: Al2O3, ZnO, TiO2
- Precursors: Liquid, solid, gas, ozone
- Up to 10 sources with 6 separate inlets
- Level sensors, cleaning and refill service