FLO-10C-12W Wafer Oven
A clean oven for cassette batches
The FLO-10C-12W is a table-top thermal chamber for batch curing in nitrogen. It holds one 300mm or 200mm cassette of 25 wafers, or four 150mm or 100mm cassettes, horizontal or vertical, in a 316 stainless steel chamber at ISO Class 4. Multi-zone heating holds uniformity within ±3.5°C after stabilisation, measured with thermocouple wafers in slots 1, 13 and 25.
Recipes are set on a 7-inch touch screen, and the oven logs temperature, gas flow, pressure and time for SPC. It connects to a host over SECS I/II (RS-232) or HSMS/SECS II (TCP/IP), and can be run remotely.
SiSTEM is Fortrend’s distributor for the UK, Ireland and Europe, and our engineers install and service the FLO on site.
Uses
Moisture removal, reflow, photoresist baking, polyimide and BCB cure, anneal and single-layer thermal processes, for semiconductor wafers, MEMS, LEDs and touch panels.
Specification
- Wafers up to 300mm: one 300mm or 200mm cassette (25 wafers), or four 150mm or 100mm cassettes (100 wafers)
- Ambient +15°C to 250°C; ±3.5°C after stabilisation
- ISO Class 4 (Federal Class 10)
- 316 stainless steel chamber
- Nitrogen 0 to 50 L/min, through one port as standard or up to three as an option
- Up to 999 programmable recipes
- SECS I/II, HSMS, USB and Ethernet
- SEMI S2 and S8
To quote we’ll ask about
- Wafer size and cassette type
- The materials and cure profiles
- Whether you need host communication or SPC logging
