Nanochrome I Thin Film Deposition
The Intlvac Nanochrome I is an R&D and pilot PVD system with a small footprint, built around e-beam evaporation and magnetron sputtering. It’s used for precision optical coatings, optical filters and anti-reflective coatings, semiconductor and dielectric films, and superconductors.
Deposition processes
Metals and dielectrics are evaporated from a 4- or 6-pocket electron beam gun. The system can also carry magnetron sputter guns and thermal evaporation boats, for co-evaporation, ion beam assisted deposition (IBAD) and multilayer e-beam films. Changing the stage angle lets it run multilayer e-beam evaporation, magnetron sputtering and ion beam etching in one pump-down.
Substrate stage
The rotating substrate stage is water-cooled directly, and stepper motors set the deposition angle automatically. Fixturing can be a flat plate planetary, a flip fixture planetary or a planetary dome. Quartz halogen lamp heaters and fully automated shutters complete the process control.
Chamber and pumping
The clamshell chamber opens fully for access. It’s all stainless steel and electropolished, with three viewports onto the source and substrates, and the instrument rack can sit on the left or the right. The system reaches 5×10-6 Torr in under 15 minutes and an ultimate pressure of 5×10-8 Torr, with a cryopump or turbomolecular pump backed by dry roughing. Pumping and venting are automated, cryopump regeneration included.
Control
Intlvac’s AUTOSYS touchscreen, built in LabVIEW, runs the system. Recipes can be viewed, edited, saved and uploaded without limit, and the full run history exports to a spreadsheet. There’s more on the processes on our thin film deposition page.
Working with SiSTEM
SiSTEM is Intlvac’s partner for the UK, Ireland and most of Europe. We scope your system with you and Intlvac’s engineers, and stay your local contact through quotation, installation and after-sales. Tell us the films you need and your substrate sizes, and we’ll take it to Intlvac.
