- Impressive System Capacity
- Advanced Evaporation Source
- Versatile Wafer Handling
- Automatic Load-Lock for Efficiency
- Wide Range of Applications
Intlvac Thin Film Corporation, a prestigious global provider of thin film deposition systems, has earned a reputation for its dedication to advancing vacuum process technology. With headquarters in Delanson, New York, and manufacturing facilities in Canada, Intlvac has been diligently serving a diverse array of industries since its inception in 1963.
Specialising in the design and manufacture of Ion Beam Etching (IBE), Ion Beam Sputtering (IBS), and Plasma-Enhanced Chemical Vapor Deposition (PECVD) systems, the company caters to the unique needs of sectors such as photonics, aerospace, electronics, and research.
Intlvac’s commitment to innovation, coupled with their extensive engineering expertise, has positioned the company as a reliable partner for clients seeking custom-tailored solutions for their thin film deposition requirements. By consistently delivering high-quality equipment and excellent customer service, Intlvac Thin Film Corporation continues to push the boundaries of material science and contribute to the evolution of next-generation technologies
Superior PVD Deposition Capability
Large Multi-Target Carousel
Rotating and Angle-Tilt Substrate Stage
Ion Assist Capability and Monitoring
High-Density Coatings with Low Particle Levels