- Indium bump deposition on wafers up to 200 mm
- Full 4 µm indium run in under 2.5 hours
- Automatic or manual load lock with in-situ pre-clean
- Wafer temperature control from +60°C to -75°C
- Hundreds of depositions without opening the main chamber
Intlvac Thin Film Systems
Intlvac Thin Film is based in Georgetown, Ontario, near Toronto. It designs and builds thin film deposition and etch systems, from small R&D and pilot systems to large production platforms.
Specialising in the design and manufacture of Ion Beam Etching (IBE), Ion Beam Sputtering (IBS), and Plasma-Enhanced Chemical Vapour Deposition (PECVD) systems, the company caters to the unique needs of sectors such as photonics, aerospace, electronics, and research & development.
Intlvac’s commitment to innovation, coupled with their extensive engineering expertise, has positioned the company as a reliable partner for clients seeking custom-tailored solutions for their thin film deposition requirements. By consistently delivering high-quality equipment and excellent customer service, Intlvac Thin Film Corporation continues to push the boundaries of material science and contribute to the evolution of next-generation technologies.
Customised Solutions
Intlvac Thin Film offers customised solutions to meet the specific needs of its customers. They work closely with their customers to develop tailored solutions that meet their unique requirements and goals.Advanced Technology
Intlvac Thin Film is known for its advanced technology and innovative solutions. They use the latest technologies such as sputtering, evaporation, and ion beam deposition to create high-performance thin films for a range of applications.High Quality
Intlvac Thin Film products are built to last, with high-quality materials and components that are designed for durability and reliability. They have strict quality control processes in place to ensure that each product meets or exceeds industry standards.Technical Support
Intlvac Thin Film provides excellent technical support to its customers, including installation, training, and ongoing support. Their team of experienced engineers and technicians is available to help customers with any issues they may encounter.Energy Efficiency
Intlvac Thin Film products are designed with energy efficiency in mind, helping customers reduce their energy costs and minimize their environmental impact.Cost-Effective
Intlvac Thin Film products are cost-effective, providing customers with high-performance vacuum deposition systems at a competitive price. This makes Intlvac Thin Film products an excellent value proposition for a wide range of industries.Products from Intlvac
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Icarus Indium Deposition System
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Aegis Diamond-Like Carbon Deposition
- Low-temperature PECVD diamond-like carbon
- Single-layer AR and protective coating for IR optics
- Better than ±1% Tavg uniformity over 508 mm
- Qualified to MIL-C-48497A, TS1888 and ISO 9022
- DLC hard masks for lithium niobate etching
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Pleiades Cluster System
- Versatile Cluster System Capabilities: Ion Beam Etching & Sputtering, Atomic Layer Deposition, Thermal Evaporation, eBeam Evaporation – Lift Off, Magnetron Sputtering Metals, Oxide & Fluoride Evaporation, Magnetron Sputtering Oxides & Nitrides
- Customisable Heating and Cooling Options
- Superior Temperature Control for Optimal Results
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Nanochrome Pico Thin Film Deposition
- Compact R&D PVD in a 16″ D-shaped chamber
- Sputter up or sputter down, easily reconfigured
- Magnetron, e-beam, thermal and Knudsen cell sources
- Optional heated stage to 800°C
- Load lock between a pair of Pico chambers
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Nanochrome I Thin Film Deposition
- R&D and pilot PVD with a 4- or 6-pocket e-beam gun
- E-beam, sputtering and ion beam etching in one pump-down
- Water-cooled stage with automatic angle control
- 5×10-6 Torr in under 15 minutes, 5×10-8 Torr ultimate
- AUTOSYS control with recipe and run logging
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Nanochrome II Thin Film Deposition
- PVD platform in evaporation or sputter configurations
- E-beam and thermal evaporation with ion assist
- Multi-cathode pulsed DC magnetron sputtering
- Substrate heating options up to 800°C
- In-situ stress monitoring on the sputter version
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Nanochrome IV UV VIS Thin Film Deposition
- Dual-Axis Rotation for Enhanced Uniformity
- Real-Time Optical Monitoring
- Operator-Friendly Design
- Cutting-Edge Cryopump Technology
- Exceptional Process Repeatability With A Baseline Uniformity Of 2%
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Nanoquest Pico Ion Beam Etch & Milling
- Compact ion milling in a 14″ D-shaped chamber
- Substrates up to 100 mm in diameter
- IBE and RIBE processes
- 1 cm to 8 cm DC, or 4 cm RF ICP ion sources
- Actively cooled, rotating substrate holder
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Nanoquest I Ion Beam Etch & Milling
- Ion beam etching of wafers up to 6 inches
- Independent control of ion energy, current density and angle
- Computer-controlled incidence angle, 0° to 270°
- Optional load lock: 1×10-6 Torr in under 30 minutes
- CAIBE, IBAD and ion beam sputter deposition
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Nanoquest II Ion Beam Etch & Milling
- 22 cm RF ICP ion source, above 1 A
- ±3% uniformity over 100 mm, ±2% wafer to wafer
- Water-cooled stage: 0 to 30 rpm, ±90° tilt
- SIMS end point detection to ±5 Å
- Load lock microscope camera, features to 1 µm
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Nanoquest III/IV Ion Beam Etch & Milling
- Batch ion beam etching on up to three platens
- Water-cooled, double-axis planetary stage
- 22 cm RF ion source: above 1 A, 100 to 1500 eV
- Optional SIMS end point detection
- PLC control through a LabVIEW interface
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Nanoquest I Combo Ion Beam Sputter Deposition & Etch
- Superior PVD Deposition Capability
- Multi-Target Carousel and Water-Cooled Stage
- Full Ion Beam Etch Capability
- Compact Design with Reputable Coatings
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Nanoquest I Ion Beam Sputter Deposition
- Versatile Deposition Capabilities
- Multi-Target Carousel
- Precision Substrate Handling
- Empowering Ion Assist Capability
- Compact Design, Premium Results
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Nanoquest II Ion Beam Sputter Deposition
Superior PVD Deposition Capability
Large Multi-Target Carousel
Rotating and Angle-Tilt Substrate Stage
Ion Assist Capability and Monitoring
High-Density Coatings with Low Particle Levels
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Nanoquest III Ion Beam Sputter Deposition
- Superior PVD Deposition Capability
- Efficient Batch Processing
- Multi-Target Carousel and Planetary Double Rotation
- Angle-Tilt Substrate Stage and Ion Assist Capability
- High-Density Coatings with Low Particles
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Nanochrome IV Ion Beam Sputter Deposition
- Superior Sputter Up Geometry
- Configurable for Various Loading Options
- Multi-Target Carousel and High-Speed Substrate Stage
- Ion Assist Capability and QCM Instrumentation
- Dynamic Optical Control for Optical Applications
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Deimos - TVAC1
- TVAC testing for instruments, optics and micro-satellites
- Black body simulation down to 150 K
- Test items held from -120°C to +120°C
- Oil-free high vacuum pumping
- Autosys PLC control with full data logging
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Phobos TVAC2 - Thermal Vacuum Chamber
- Midsize thermal vacuum test system
- 304 stainless steel chamber
- Dry-pumped high vacuum below 10-6 torr
- Simulated space vacuum and thermal conditions
- Autosys PLC control with full data logging
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Ares - TVAC3 Thermal Vacuum Chamber
- Thermal cycling of components under high vacuum
- Horizontal chamber with doors at both ends
- Large selection of instrumentation ports
- Radiative heat transfer from a black-coated shroud
- Oil-free high vacuum pumping
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Aether Vacuum Degassing
- Vacuum degassing of small components for space use
- Baked by thermal radiation under high vacuum
- Working area 400 mm diameter by 483 mm deep
- Viewport with explosion guard; lid opens to 45°
- PLC control with data logging and remote operation