Nanoquest Pico Ion Beam Etch & Milling
The Intlvac Nanoquest Pico is a compact ion milling system for thin film research and development, used in semiconductor, spintronics, photonics and data storage work. Its 14″ D-shaped chamber and small footprint fit into most labs, and it takes substrates up to 100 mm in diameter.
Ion beam etching on a small footprint
The Pico runs ion beam etching (IBE) and reactive ion beam etching (RIBE). Removal is physical, so it etches films that chemical and plasma dry etching struggle with, including noble metals, magnetic and superconducting materials, insulators, diamond films and optical waveguides.
Ion sources
The ion source is chosen to suit the work:
- 1 cm DC source: 10 mA beam current, up to 500 eV
- 4 cm DC source: up to 120 mA and 1200 eV, with a filament neutraliser
- 4 cm RF ICP source: 150 mA, 100 to 1200 eV, with a low-energy remote neutraliser
- 8 cm DC source: 250 mA, 100 to 1200 eV, with a filament neutraliser
Substrate stage
Substrates sit on an actively cooled holder that rotates at 0 to 10 rpm.
Working with SiSTEM
SiSTEM is Intlvac’s partner for the UK, Ireland and most of Europe. We scope your system with you and Intlvac’s engineers, and stay your local contact through quotation, installation and after-sales. Tell us your substrate sizes and the materials you need to etch, and we’ll take it to Intlvac.
