Nanochrome II Thin Film Deposition

The Intlvac Nanochrome II is a PVD platform built in two configurations. The evaporation version runs e-beam and thermal evaporation with ion assist, including high-temperature processes. The sputter version runs several magnetron cathodes for automatic multilayer deposition. Both share the same chamber, so the system is specified around the films you need.

Evaporation configuration

The chamber is a vertical clamshell that opens for access to every part. Water cooling and heating traces shorten pump-down, a periscope gives a view of the sources while they run, and several optical paths let you measure and control optical coatings as they grow.

E-beam evaporation handles metals and dielectrics, with ion assist. Thermal evaporation and magnetron sputtering can be added, including reactive sputtering from pulsed RF, DC or AC supplies. For delicate films such as indium, tin, cryolite and zinc sulphide, a cold-wall, high vacuum chamber and careful temperature control allow automatic deposition.

Fixturing and temperature

Substrate holders can be a flat plate planetary, a rotating hub, a flip fixture planetary or a planetary dome. Quartz halogen lamp heaters, quartz crystal sensors, thermocouples and automated shutters give process control. For high-temperature work, IR backside heaters, quartz lamp arrays and oxygen-resistant elements reach up to 800°C. For low-temperature work, cooled substrate stages with single or double axis planetary motion circulate coolant directly under the substrates.

Ion sources

Filament-less ion sources handle pre-cleaning, ion assist and reactive deposition. End-Hall gridless sources give up to 10 A of ion current below 300 eV, and gridded RF sources give up to 1 A at 100 to 1000 eV.

Sputter configuration

The sputter version deposits high-quality metal films by magnetron sputtering from several cathodes on pulsed DC supplies, with low-energy ion cleaning of the substrate. It runs either as long-throw, low-pressure ion-assisted sputtering or as conventional sputtering in the millitorr range, and builds multilayers of metal and dielectric films. In-situ stress monitoring follows each film as it grows.

Vacuum and control

Pumping is completely dry. The evaporation version reaches an ultimate pressure of 5×10^-8 Torr without heating, and the sputter version is built for UHV. Pump-down is fully automatic, and every operation is controlled and logged. There’s more on the processes on our thin film deposition page.

Working with SiSTEM

SiSTEM is Intlvac’s partner for the UK, Ireland and most of Europe. We scope your system with you and Intlvac’s engineers, and stay your local contact through quotation, installation and after-sales. Tell us the films you need and your substrate sizes, and we’ll take it to Intlvac.