Nanoquest I Ion Beam Etch & Milling


Welcome to the world of precision substrate fabrication with the Intlvac Nanoquest I Ion Beam Etch & Milling Tool. This cutting-edge system is the ideal platform for etching single wafer substrates up to 4 inches (expandable up to 5 inches for specialised configurations and enhanced performance). Designed with versatility in mind, the Nanoquest I boasts a high cooling flow substrate stage, allowing seamless etching through photoresist or masks to create patterned substrates on any material.

Compact Design, Uncompromised Performance

Housed in a compact one-piece frame with an integral electronics rack, the Nanoquest I minimises lab or cleanroom space while delivering exceptional performance. Its high vacuum design principles ensure quick cycle times and low ultimate pressure performance, guaranteeing efficient and reliable etching results. Stable ion source operation is ensured through UHP Gas distribution.

Automated Excellence

Experience the convenience of complete automation with the Nanoquest I. Pump down, gas flow control, and ion source operation are fully automated, delivering repeatable and reliable etching for your substrates. With a user-friendly touch screen LabView interface to the PLC controller, you have intuitive control at your fingertips.

Enhanced Efficiency with Nanoquest I-LL (Load Lock) System

The Nanoquest I-LL (Load Lock) system incorporates a magnetically coupled rotary linear drive, ensuring safe and efficient substrate transport into the etch chamber. Enjoy faster etch turnaround times, greater run-to-run repeatability, and reduced particulate generation with the load lock feature. The UHV design practically eliminates water vapor and process drift, optimising performance.

Versatile Chamber Design

The 20-inch diameter UHV-designed chamber houses the substrate stage, which is mounted on the door, presenting the substrate to the ion source at various angles and rotational speeds. The motorised variable angle stage offers precise rotation and temperature control for tailored etching processes.

Flexible Configurations for Maximum Potential

The Nanoquest I can be configured for ion beam sputtering, e-beam evaporation, or both, providing the flexibility to address a wide range of thin film fabrication needs. Additionally, it is perfectly suited for Glancing Angle Deposition (GLAD), enabling the manufacturing of effective medium materials. Discuss your requirements with us to explore purchasing a dedicated system or upgrading to a GLAD stage.

Experience the Power of Precision

Unlock the true potential of precision substrate fabrication with the Intlvac Nanoquest I Ion Beam Etch & Milling Tool. Embrace innovation, reliability, and efficiency in your thin film processes. Let the Nanoquest I redefine your approach to substrate etching and milling, empowering you to achieve extraordinary results in nanofabrication and beyond.

Speak to a specialist

With so many permutations available, the best way for us to help you is for us to know more about what you are trying to achieve. Contact us today for no obligation help, advice and solutions for semiconductor, nanotechnology, biotechnology and any other precision engineering equipment requirements.