Nanochrome Pico Thin Film Deposition
The Intlvac Nanochrome Pico is a compact PVD system for prototyping and R&D. Its 16″ D-shaped chamber and small footprint fit into most labs. It’s configured for e-beam evaporation for lift-off, optical interference filters, multilayer barrier coatings and transparent conductive oxides (TCOs).
Modular sources
The modular design makes the Pico easy to reconfigure, for example from sputter up to sputter down. It can carry:
- Up to three 3″ DC, RF, AC or pulsed DC magnetrons
- Up to two single-pocket or multi-pocket e-beam sources
- Up to six thermal evaporation sources
- Knudsen cell evaporation
- A Mark I end-Hall ion source for pre-clean, ion assist and reactive deposition
Lift-off uses the extended-height Pico chamber.
Substrates and heating
Substrates sit on a standard rotary table or hub, with a water-cooled stage or a 500°C or 800°C heated stage as options. The chamber can be heated to 300°C.
Pumping
The Pico reaches 5×10-6 Torr in under 10 minutes, with an ultimate pressure better than 1×10-7 Torr.
Load lock and expansion
A load lock can transfer substrates from atmosphere, or between a pair of connected Pico chambers, so one chamber can be kept for metals and the other for oxides. The Pico can also be fitted with a glovebox or retrofitted onto a cluster tool. There’s more on the processes on our thin film deposition page.
Working with SiSTEM
SiSTEM is Intlvac’s partner for the UK, Ireland and most of Europe. We scope your system with you and Intlvac’s engineers, and stay your local contact through quotation, installation and after-sales. Tell us the films you need and your substrate sizes, and we’ll take it to Intlvac.
