Purience PVA Roller Brushes for Post-CMP Cleaning

Purience

Purience PVA roller brushes scrub slurry particles and residue from the wafer after chemical mechanical planarisation. They’re made in 200 mm and 300 mm sizes for the post-CMP cleaners most fabs already run, and SiSTEM Technology supplies them from UK stock to customers in the UK, Ireland and Europe. Purience is a South Korean consumables maker that started in 2022 as an in-house venture of SK hynix.

Which brush fits your cleaner

Wafer sizeCleanerBrush, mm (outside diameter x core x length)Purience part number
200 mmAMAT Mirra Mesa70 x 31 x 218IC70-AM31-H218-P
200 mmLam Research OnTrak60 x 32 x 241IC60-ON32-H241-P
200 mmDoosan DND Unipla60 x 32 x 254MC60-UN32-H254-P
200 mmEbara F-REX20038 x 18 x 218MC38-EB18-H218
300 mmAMAT Reflexion LK70 x 31 x 319IC70-AL31-H319-P, MC70-AL31-H319-P
300 mmAMAT Reflexion LK70 x 31 x 318IC70-AL31-H318-C
300 mmEbara F-REX300X60 x 32 x 309IC60-EX32-H309-P, MC60-EX32-H309-P
300 mmEbara F-REX300S238 x 18 x 310MC38-ESS18-H310-P

If your cleaner isn’t listed, send us its make and model and the part number of the brush you use now. Purience also makes brushes to customer requirements.

Brush and core in one part

Purience makes the PVA sponge and its core as one integrated part. The core carries a strip structure that stops slip and keeps moisture even along the brush, and a pit design that stops the sponge rotating idle on the core or twisting.

The PVA

PVA is rigid when dry and soft when wet. Purience’s material is hydrophilic with interconnected open cells, and Purience controls pore size and shape in manufacture. It doesn’t shed lint, it won’t scratch the wafer surface and it’s heat resistant to 80°C wet and 120°C dry. Porosity is 88 to 90% on 200 mm brushes and 90% on 300 mm.

Chemical resistance

The maximum concentrations Purience rates the brush for:

ChemicalUp toChemicalUp to
Acetic acid3%Hydrogen peroxide5%
Acetone20%Isopropanol8%
Ammonium hydroxide20%Methanol20%
Citric acid10%Methyl ethyl ketone10%
EDTA10%Phosphoric acid5%
Ethanol10%Sodium hydroxide5%
Hydrochloric acid3%Sulfuric acid5%
Hydrofluoric acid5%

Tetrahydrofuran attacks the brush, and xylene hardens it slightly.

Cleaned and inspected before packing

Each brush is cleaned to a particle specification, then checked for particle cleanliness, straightness, roundness and size. It’s sealed in three layers of packaging, and the seal is inspected last. Purience’s product guide, in the downloads below, lists the ion and metal contamination levels for the brush in parts per billion.

Where they’re used

Post-CMP cleaning from front end to back end of line and in packaging, plus photomask cleaning and substrate reclaim. Purience also lists uses in display manufacturing and thin film coating. Our post-CMP cleaning page covers brush and megasonic cleaning side by side.

Ordering and samples

We hold Purience brushes in stock in the UK. If you’re changing brush supplier, we can arrange samples so you can qualify the brush on your own cleaner first. Send us the cleaner make and model, the brush you use now and roughly how many you use a month, and we’ll come back with the matching part and a quotation.

Purience PVA Roller Brushes for Post-CMP Cleaning

Speak to a specialist

With so many permutations available, the best way for us to help you is for us to know more about what you are trying to achieve. Contact us today for no obligation help, advice and solutions for semiconductor, nanotechnology, biotechnology and any other precision engineering equipment requirements.