Apogee 200 Spin Developer
A benchtop spin developer for substrates up to 200 mm
The CEE Apogee 200 is a benchtop spin developer for wafers up to 200 mm round and squares up to 6″ x 6″. It runs at up to 12,000 rpm with 0.2 rpm speed repeatability, and every spray, stream and rinse step is programmed from its touchscreen. Cost Effective Equipment have made spin processing equipment since 1987 and build the Apogee in the United States. SiSTEM supplies it across the UK and Europe.
Where it’s used
SiSTEM has supplied Apogee spin developers to companies throughout the UK and Europe since 2020. Some run as benchtop tools, and others sit in X-Pro II workstations beside coaters and bake plates.
Development methods
Developer goes on by spray or by stream. Spray nozzles sit directly over the substrate at 90° for continuous spray, or outside the wafer edge at 45° aimed at the centre. Stream dispense puddles developer and DI water onto the substrate, much like a standard spin coat.
Developer can be fed from 1-gallon pressure cans to up to four spray or stream nozzles, among other dispense options. Top and backside DI water rinse are available, fed from a pressure can or the building’s DI supply, and an optional nitrogen blow-off speeds up drying.
Programming and process data
Recipes take an unlimited number of steps, timed to 0.1 seconds with up to 9,999.9 seconds a step, and speed and acceleration can change within a run. Acceleration reaches 30,000 rpm/s unloaded, or 13,000 rpm/s with a typical 200 mm wafer.
DataStream logs every run alongside room temperature and humidity. Recipes and logs move over USB or Ethernet, and you can watch or edit a tool from a web browser outside the cleanroom.
Built for a long service life
The spin bowl is high-density polyethylene, with drain and exhaust ports built in. An indirect drive keeps the motor out of the chemical path, and vacuum and lid interlocks stop a run if the substrate isn’t held or the lid is open. The Apogee 200 developer is CE marked, and ETL listed through Intertek for North America.
Options
AccuScan dispense adds precision dispense and edge bead removal, and a drain separator diverts waste through separate paths. The Apogee 200 developer is available as a benchtop unit or for flange mounting in a wet deck, and it fits CEE’s X-Pro II workstation alongside spin coaters and bake plates.
Specifications
- Substrates: up to 200 mm round; up to 6″ x 6″ square
- Spin speed: up to 12,000 rpm, repeatability and resolution 0.2 rpm
- Acceleration: up to 30,000 rpm/s unloaded
- Step time: 0.1 s resolution, 9,999.9 s maximum
- Dimensions: 13.25″ W x 21″ D x 20″ H (337 x 533 x 508 mm)
- Weight: 40 lb (18.1 kg) excluding accessories
- Power: 100-120 or 208-230 VAC, 6 A maximum
- Vacuum: below 33 kPa absolute
- N2 or CDA for automated dispense: 70 psi (482 kPa)
- Drain 3/4″ OD; exhaust 1″ OD (2″ on X-Pro models)
Buying through SiSTEM
SiSTEM quotes and supplies the Apogee 200 developer in the UK and Europe and handles the one-year parts-and-labour warranty in territory. CEE’s remote technical support and application process assistance run for the life of the tool.
Prices depend on the configuration, mainly mounting and dispense, so each system is quoted individually. Send us your substrate sizes and the resist and developer you’re using, and we’ll put together a quote for the right set-up.
