Apogee Spin Developer
Experience unparalleled precision and exceptional quality with the Cost Effective Equipment Apogee Spin Developer. This advanced equipment not only delivers top-tier results but also offers easy access to comprehensive process data and recipe creation techniques. The Cost Effective Equipment Apogee Spin Developer provides a winning combination of superior performance and optimal value for your development needs.
When traditional methods like tank immersion or batch processes fall short, the CEE Spin Developers step in to deliver exceptional results. Designed for single substrate spray developing, these cutting-edge tools provide precise control over liquid materials dispensing, wafer rotation, and unlimited recipe steps, ensuring stable and repeatable pattern development.
Versatility is at the core of CEE Spin Developers. They can be easily configured for fan-style top-spray or side-spray, as well as puddle dispense, utilising a wide range of materials including pre-wets, developer, rinse agents, solvents, and nitrogen blow-off for enhanced drying. These adaptable tools are extensively utilised in various industries, including leading-edge photolithography, e-beam lithography, thick film MEMS, bio-medical processing, photomasks, and other exotic substrates.
To further enhance process control, optional programmable exhaust management is available, providing an additional layer of recipe control for critical processes.
When consistency and yield are paramount, rely on Cost Effective Equipment Spin Developers for their unparalleled performance and precise control, ensuring your exacting needs are met every time.
