Apogee 200 Spin Coater
A benchtop spin coater for substrates up to 200 mm
The CEE Apogee 200 is a benchtop spin coater for wafers up to 200 mm round and squares up to 6″ x 6″. It runs at up to 12,000 rpm with 0.2 rpm speed repeatability, and every recipe step is programmed from its touchscreen. Cost Effective Equipment build it in the United States, and SiSTEM supplies it across the UK and Europe.
Where it’s used
Apogee spin coaters are very popular with universities and research institutes across the UK and Europe, and with spin-out companies setting up their first lithography processes. Labs we supplied in 2018 still order chucks and spares from us.
Programming and process data
Recipes take an unlimited number of steps, timed to 0.1 seconds with up to 9,999.9 seconds a step, and speed and acceleration can change within a run. Acceleration reaches 30,000 rpm/s unloaded, or 13,000 rpm/s with a typical 200 mm wafer. DataStream logs every run alongside room temperature and humidity. Recipes and logs move over USB or Ethernet, and you can watch or edit a tool from a web browser outside the cleanroom.
Bowl and chemistry
The spin bowl is high-density polyethylene, with optional disposable polyethylene liners for quick changeovers between chemistries. The lid gap adjusts for thick or thin films. An optional nitrogen purge gives an inert spin environment, and the drain and exhaust ports are built in.
Built for a long service life
An indirect belt drive keeps the motor out of the chemical path, so solvent can’t reach it. Vacuum and lid interlocks stop a run if the substrate isn’t held or the lid is open. The Apogee 200 is CE marked, and ETL listed through Intertek for North America.
Options
Automated dispense options include AccuScan, cartridge, pressure can and disposable syringe systems, with edge bead removal and backside rinse. Spin chucks come in standard, recessed, captive, porous ceramic and film frame formats. The Apogee 200 is available as a benchtop unit or for flange mounting in a wet deck, and it fits CEE’s X-Pro II workstation alongside developers and bake plates.
Specifications
- Substrates: up to 200 mm round; up to 6″ x 6″ square
- Spin speed: up to 12,000 rpm, repeatability and resolution 0.2 rpm
- Acceleration: up to 30,000 rpm/s unloaded
- Step time: 0.1 s resolution, 9,999.9 s maximum
- Dimensions: 13.25″ W x 21″ D x 14.25″ H (337 x 533 x 362 mm)
- Weight: 40 lb (18.1 kg) excluding accessories
- Power: 100-120 or 208-230 VAC, 6 A maximum
- Vacuum: below 33 kPa absolute
- N2 or CDA for automated dispense: 70 psi (482 kPa)
- Drain 3/4″ OD; exhaust 1″ OD (2″ on X-Pro models)
Buying through SiSTEM
SiSTEM quotes and supplies the Apogee 200 in the UK and Europe and handles the one-year parts-and-labour warranty in territory. CEE’s remote technical support and application process assistance run for the life of the tool. Prices depend on the configuration, mainly mounting, dispense and chucks, so each system is quoted individually. Send us your substrate sizes and the materials you’re coating, and we’ll put together a quote for the right set-up.
