Spin Coaters

A spin coater is a tool used in semiconductor photolithography to deposit a thin, even layer of photoresist material onto a substrate, such as a silicon wafer. The photoresist material is dispensed onto the spinning substrate, which spreads it out evenly using centrifugal force. The speed and duration of the spin can be adjusted to control the thickness of the deposited layer. Spin coating is a critical step in semiconductor photolithography, as it enables the precise deposition of photoresist material, which is essential for creating complex microelectronics and MEMS devices.