- Automated atmospheric curing oven, up to 250°C
- 200mm and 300mm wafers, from FOUPs or cassettes
- Class 10 chamber, ±3.5°C uniformity
- Installed and serviced by SiSTEM across Europe
Thermal Processing
Thermal processing covers the furnaces and ovens that heat wafers, and the heaters inside them. SiSTEM supplies equipment and parts from three principals here.
DS Fibertech makes heating elements for vertical and horizontal diffusion furnaces: direct replacements for TEL, Kokusai, ASM and other OEM furnaces, new or refurbished, with factory burn-in. Start with the replacement elements page if you have a part number.
Fortrend builds wafer curing ovens for 200mm and 300mm wafers, loading from FOUPs or cassettes: atmospheric up to 250°C, vacuum from 50°C to 450°C, and a table-top clean oven.
Process Technology heaters bring DI water and process chemistries up to temperature inline. The full range is on the inline DI water and chemical heaters page.
Tell us the tool, the process temperature and the part number or drawing, and we’ll quote.
Thermal Processing Products
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SIO-300-200 Thermal Curing System
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FVO-450 Vacuum Curing Oven
- Vacuum curing for 200mm and 300mm wafers, 50°C to 450°C
- 50 wafers per chamber, in one or two chambers
- Oxygen below 10 ppm with nitrogen purge
- Installed and serviced by SiSTEM across Europe
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FLO-10C-12W Wafer Oven
- Table-top clean oven for wafers up to 300mm
- Ambient +15°C to 250°C, ±3.5°C uniformity
- ISO Class 4, horizontal or vertical cassettes
- Installed and serviced by SiSTEM across Europe
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Replacement Diffusion Furnace Heating Elements
- Direct replacements to the OEM part number
- TEL, Kokusai, ASM, Centrotherm, MRL, BTI, SVG/Aviza, Thermco
- New or refurbished from your used element
- Factory burn-in before shipping
- Reverse-engineered from a drawing or sample
- Supplied in the UK and Ireland
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Vulcan Semiconductor Diffusion Heater
- Rated to 1,350°C
- Kanthal APM element wire
- Reinforced against sagging at zone interfaces
- Interlocking high-strength ceramic separators
- Crack-resistant end vestibules
- 1,800°C alumina coating against dust
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Hercules Semiconductor Diffusion Heater
- Rated to 1,300°C
- Kanthal A1 element wire
- Reinforced against sagging at zone interfaces
- Interlocking high-strength ceramic separators
- Crack-resistant end vestibules
- 1,800°C alumina coating against dust
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Mercury Semiconductor Diffusion Heater
- 350°C to 1,250°C
- Low mass for fast ramp and fast cool
- Open, recessed helical coil
- Kanthal APM or A1 element wire
- Line-voltage option, no transformer
- Standard terminal leads
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Apollo Semiconductor Diffusion Heater
- Up to 1,000°C
- Designed for fast ramp
- Low-mass Kanthal A1 element wire
- Helical coil for zone uniformity
- Line-voltage option, no transformer
- Standard terminal leads
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Diffusion Furnace Torches, Vestibule Blocks and Ceramic Fibre Parts
- High- and low-flow torch elements
- Replacement torches for TEL, Kokusai, Tempress, Thermco, SVG
- Vestibule blocks and end chambers to 1,500°C
- Toughened outer skin on end chambers
- Alumina-silica collars and heat disks
- Vacuum-formed fibre shapes made to drawing
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Tytan Water Heater
- Titanium elements and wetted parts
- 12 kW to 144 kW
- Single pass or recirculating
- Wall mounted up to 72 kW
- Temperature held as flow changes
- Compatibility: DI and RO water
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Lufran DI Water Heater
- PTFE and PVDF wetted surfaces
- Purged PTFE-covered elements
- Temperature follows changes in flow
- Up to 90°C, 1 to 200 litres a minute
- Turn-key system
- Watts: 24 kW to 312 kW