Thin Film Deposition Systems

Thin film deposition puts down layers of material, from a few nanometres to several microns thick, onto wafers, optics and components. The method you choose decides the film’s density, purity, stress and uniformity, and how well it suits lift-off, optical multilayers or production volumes. Intlvac Thin Film builds systems for each of the main physical vapour deposition (PVD) methods, and for diamond-like carbon by PECVD. SiSTEM is Intlvac’s partner for the UK, Ireland and most of Europe.

Electron beam evaporation

An electron beam heats source material in a water-cooled crucible until it evaporates, and the vapour condenses on the substrate. The deposition front is directional, which suits lift-off, and a multi-pocket gun lets one run build metal and dielectric multilayers. Ion assist densifies the film as it grows.

• The Nanochrome I is an R&D and pilot system with a 4- or 6-pocket e-beam gun.
• The evaporation version of the Nanochrome II adds thermal sources and substrate heating options up to 800°C.
• The Nanochrome Pico is the compact R&D option.

More on choosing one: electron beam evaporation systems.

Magnetron sputtering

A magnetron holds a plasma close to the target, and ions from it sputter target atoms onto the substrate. Sputtering suits metals, alloys and reactive oxide and nitride films, and gives good adhesion and step coverage.

• The sputter version of the Nanochrome II runs several cathodes from pulsed DC supplies, with in-situ stress monitoring.
• The Nanochrome Pico takes up to three 3″ magnetrons, set up to sputter up or down.

Ion beam sputter deposition

A broad ion beam from a separate source sputters the target, so the process runs at low pressure, away from the plasma. The films are dense and smooth, with low particle counts, which suits precision optical coatings. The Nanochrome IV IBSD coats substrates up to 250 mm. There’s more on the method on our ion beam sputter deposition page.

Diamond-like carbon by PECVD

The Aegis deposits diamond-like carbon from hydrocarbon precursors at low temperature. It’s used for protective and anti-reflection coatings on IR optics, and as a hard mask for lithium niobate etching. More on the DLC coating systems page.

Indium evaporation for bump bonding

The Icarus evaporates indium for bump bonding on wafers up to 200 mm, for focal plane arrays, quantum devices and semiconductor packaging. More on the process: indium bump deposition.

Etch on the same platform

Several Intlvac deposition systems also etch. The Nanochrome I can run e-beam evaporation, magnetron sputtering and ion beam etching in one pump-down, and the Nanoquest I IBSD Combo deposits and etches on substrates up to 100 mm. For etch on its own, see ion beam etching and milling.

Scoping a deposition system

To put a system together with Intlvac, we’ll ask about:

• the films you need and the materials in each layer
• thickness, uniformity and stress targets
• substrate size, shape and how many per run
• R&D, pilot or production use, and whether a load lock is needed
• substrate heating or cooling, and how you need to monitor the process

Working with SiSTEM

SiSTEM is Intlvac’s partner for the UK, Ireland and most of Europe. We scope your system with you and Intlvac’s engineers, and stay your local contact through quotation, installation and after-sales.